Magnetic sensitive transistor

A new method to etching emitter region groove approach of magnetic sensitive transistor was proposed by combine laser with MEMS technique .

提出了一种激光与微电子机械加工系统（MEMS）相结合刻蚀硅磁敏三极管发射区引线槽的方法。

The results from the experiment show that new method can etch emitter region groove approach of magnetic sensitive transistor with high quality and high etching rates of Si , and process Si of < 111 > without mask .

实验结果表明，利用这种新方法刻蚀的硅磁敏三极管发射区引线槽具有刻蚀速率大、质量好的优点，并且可以实现对，〈111〉晶向硅片无掩膜加工。